Integrated circuit trench etch with incremental oxygen flow

United States of America Patent

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Issued Date
Oct 31, 2002
app pub date
Mar 1, 2001
filing date
Sep 22, 2000

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Abandoned

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Abstract

Trenches are made in an integrated circuit by a process that incrementally increases the amount of oxygen during a trench etch. The trench may be an isolation trench or a gate trench for a QVDMOS device.

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Patent Owner(s)

Patent Owner	Address
SEMICONDUCTOR COMPONENTS INDUSTRIES LLC	5005 E MCDOWELL ROAD MAILDROP A700 PHOENIX AS 85008

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Cumbo, Joseph L	West Wyoming, PA	4	168
Grebs, Thomas E	Mountaintop, PA	46	2120

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Integrated circuit trench etch with incremental oxygen flow

Number of patents in Portfolio can not be more than 2000

United States of America Patent

09797323

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09797323

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