Plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20020185226A1
SERIAL NO

10043265

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A solenoidal magnetic field generated by a coil around the upper chamber A acts as a magnetic plasma attenuator. By judicious adjustment of the magnetic field strength, a dense plasma region forms inside the tube and adjacent to an antenna and is at least partially trapped by the field lines. These field lines intersect the wall of the upper chamber near or on the lid, and either on the upper chamber wall near its base, or on the lid or upper walls of the lower chamber. Significant numbers of radicals can be created in the upper chamber, which then diffuse into the lower chamber. The associated ion flux is reduced, however, because of losses where the field lines intersect the walls, thereby ensuring that the ratio of ion numbers to radical numbers reaching the wafer is reduced.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SURFACE TECHNOLOGY SYSTEMS PLCGWENT

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashraf, Huma Newport, GB 16 498
Bhardwaj, Jyoti Kiron Cupertino, CA 36 740
Hopkins, Janet Crickhowell, GB 8 494
Lea, Leslie Michael Didcot, GB 17 370

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation