Article holders that use gas vortices to hold an article in a desired position
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Dec 12, 2002
app pub date -
Jun 8, 2001
filing date -
Jun 8, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An article (e.g. a semiconductor wafer) is held in an article holder by means of a number of gas flows emitted from gas vortex chambers. Some of the gas flows act to cool an adjacent article portion more than the other gas flows. For example, some of the vortex chambers emit more gas per unit of time than the other chambers. More cooling is provided to those portions of the article which are heated more during processing. Greater temperature uniformity can be achieved.
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