Dangerous process/pattern detection system and method, danger detection program, and semiconductor device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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-
N/A
Issued Date -
Jan 16, 2003
app pub date -
Jul 12, 2002
filing date -
Jul 12, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A system for detecting dangerous process/pattern includes: an input data processing unit configured to convert input data into formatted data; a critical condition storage unit configured to store critical conditions for defect generation; a universal simulation unit configured to perform at least process simulation for the formatted data and output those result as dangerous process determination-formatted data; and a mask simulation unit configured to perform mask simulation for the formatted data and output those result as dangerous pattern determination-formatted data. In addition, the system includes a dangerous process determination unit configured to compare the dangerous process determination-formatted data and the critical conditions, and determine whether it is a dangerous process; and a dangerous pattern determination unit configured to compare the dangerous pattern determination-formatted data and the critical conditions, and determine whether or not it is a dangerous pattern.
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