Electrochemical device
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United States of America Patent
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Issued Date -
Feb 13, 2003
app pub date -
Aug 23, 2002
filing date -
May 20, 1999
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The invention relates to an essentially metallic target of a cathodic sputtering device, in particular a magnetic-field-assisted device, the said target mainly comprising nickel alloyed with at least one other minor element in order to reduce or eliminate its ferromagnetism. The invention also relates to the use of the target to manufacture an electrochromic material with anodic colourization as a thin layer based on alloyed nickel oxide.
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