Method for chemically etching photo-defined micro electrical contacts
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United States of America Patent
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Jun 14, 2005
Grant Date -
Mar 27, 2003
app pub date -
Dec 20, 2001
filing date -
Sep 20, 2001
priority date (Note) -
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Abstract
A method of fabricating a plurality of micro probes comprising the steps of defining the shapes of a plurality of probes as a mask, applying a photoresist to a surface of a metal foil, overlaying the mask on the metal foil, exposing the photoresist to light passed through the mask, developing the photoresist, removing a portion of the photoresist to expose a portion of the metal foil, applying an etcher to the surface of the metal foil to remove the exposed portion to produce a plurality of probes, and chemically polishing and plating the plurality of probes.
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