Process and materials for formation of patterned films of functional materials
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United States of America Patent
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Issued Date -
Apr 17, 2003
app pub date -
Oct 17, 2001
filing date -
Oct 17, 2001
priority date (Note) -
Abandoned
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Abstract
The invention is for a method and composition for forming one or more patterned layers of functional material over a substrate. The method comprising providing a coating composition comprising a photopatterning material containing a particulate filler of a functional material. The particulate filler is one that is essentially transparent to activating radiation. Once formed, the coating is exposed to activating radiation in an image pattern and developed to form the patterned layer of functional material. The organic components of the coating can be removed if desired.
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