Methods for angle limiting deposition mask
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United States of America Patent
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Mar 30, 2004
Grant Date -
May 8, 2003
app pub date -
Nov 6, 2001
filing date -
Nov 6, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
A method for depositing a material onto a plurality of features located on a surface of a substrate provides more accurate and consistent control over where the material is deposited. The method comprises evaporating the material to create an evaporant stream, positioning the substrate so that the evaporant stream strikes the plurality of features over a range of exposure angles between the evaporant stream and the substrate, moving the substrate to vary the range of exposure angles over which the evaporant stream strikes the plurality of features, and moving one or more shutters into the evaporant stream to block any part of the evaporant stream that has an exposure angle greater than a critical exposure angle.
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