Apparatus for the uniform heating of substrates or of surfaces, and the use thereof
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United States of America Patent
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N/A
Issued Date -
May 22, 2003
app pub date -
Nov 13, 2002
filing date -
Nov 21, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
For the uniform heating of substrates or surfaces of metallic, mineral, organic or nonmetallic materials an infrared radiation source of at least one elongated tubular radiator is provided, while electrical terminals for supplying the radiator are situated in the cold area of a radiation housing; an infrared radiator with bases at least at both ends is configured as the infrared radiation source, which is situated with its radiating part in a tube chamber (1) with reflective surface which is open in the direction of emission, while the terminal ends of the radiator are each in end chambers (4, 5) closed off from the tube chamber (1) for protection against heating; the infrared radiation source has advantageously a plurality of infrared radiators which are arranged in a plane perpendicular to the direction of emission.
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