Apparatus and method for preventing a wafer mapping system of an SMIF system from being polluted by corrosive gases remaining on wafers
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United States of America Patent
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Jul 8, 2003
Grant Date -
Jun 5, 2003
app pub date -
Dec 5, 2001
filing date -
Dec 5, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus and a method for preventing a wafer mapping system of an SMIF system from being polluted by a corrosive gas remaining on wafers according to the present invention are disclosed. The wafer mapping system includes a plurality of mirrors and sensors used to detect the positions of the wafers. The apparatus of the prevent invention comprises a pipe having a plurality of holes thereon and a purge gas flowing inside the pipe, and is characterized in that the purge gas is emitted out from the plurality of holes toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers. The method of the prevent invention is characterized by emitting a purge gas from a pipe toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers.
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