Supercritical fluid processes with megasonics
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jun 26, 2003
app pub date -
Jan 24, 2003
filing date -
Apr 18, 2001
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An apparatus and process for cleaning residual matter, photoresist and other foreign materials off wafers, substrates and semiconductor work pieces including photomasks, compact discs, flat panel displays using megasonic acoustic wave action techniques in conjunction with supercritical fluid cleaning processes, and in particular, for coupling megasonics techniques with supercritical carbon dioxide processing with co-solvents and surfactants, using cycles of soak, rapid decompression and flushing, to improve cleaning capability and to remove submicron particles from the surfaces of wafers.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully