System for supplying a gas and method of supplying a gas
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jul 17, 2003
app pub date -
Aug 2, 2002
filing date -
Jan 17, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention provides a system for supplying a gas capable of supplying a gas at a proper flow rate and forming a gas at a proper rate from a gas-forming unit. The invention provides a system for supplying a gas including a gas-forming unit, a gas supply passage for supplying a gas produced from the gas-forming unit, a gas flow rate controller provided in the gas supply passage, a gas discharge passage provided in parallel with the gas supply passage to discharge the gas produced from the gas-forming unit, and a pressure controller provided in the gas discharge passage to control the pressure of the gas flowing through the gas discharge passage. In the above system for supplying a gas, it is possible to optimize the flow rate of the gas that is supplied and the amount of the gas generated by the gas-forming unit.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully