Novel method for forming polymer pattern
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United States of America Patent
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Issued Date -
Aug 14, 2003
app pub date -
Nov 19, 2002
filing date -
May 22, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for forming a combinatorial polymer pattern, which comprises immersing a particulate carrier in monomer addition reactors successively in accordance with a predetermined order using a particle transporting means, to thereby prepare a particle having a polymer having a predetermined sequence bonded thereto, and arranging such particles systematically. The method is practiced by using a plurality of reactors, each of which is provided for a specific monomer, a device for controlling the transfer of particles between the reactors, and a device for arranging particles on a substrate.
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