Rare-earth pre-alloyed PVD targets for dielectric planar applications
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United States of America Patent
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Mar 16, 2002
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Mar 16, 2002
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Abstract
A target material for deposition of rare-earth doped optical materials is described. The rare-earth ions, for example erbium and ytterbium, is prealloyed with host materials. In some embodiments a ceramic target material can be formed by pre-alloying Er.sub.2O.sub.3 and/or Yb.sub.2O.sub.3 with Al.sub.2O.sub.3 and/or SiO.sub.2. In some embodiments, a metal target material can be formed by pre-alloying Er and/or Yb with Al and/or Si. In some embodiments, ceramic or metallic tiles are formed which can be mounted on a backing plate. In some embodiments, an intermetallic mixture can be formed and flame sprayed onto the backing plate.
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