Positive resist composition

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United States of America Patent

PATENT NO 6893792
APP PUB NO 20030194639A1
SERIAL NO

10366673

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Abstract

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The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.

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Patent Owner(s)

Patent OwnerAddress
FORTINET INC899 KIFER RD SUNNYVALE CA 94086

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hashimoto, Kazuhiko Toyonaka, JP 91 1995
Miya, Yoshiko Kyoto, JP 13 141
Toishi, Kouji Hannan, JP 13 235

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