Method and system for cleaning a wafer chuck
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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N/A
Issued Date -
Oct 30, 2003
app pub date -
Apr 30, 2002
filing date -
Apr 30, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention relates to a method of cleaning a wafer chuck (10) by an automated system that supplies a solvent to a chuck surface (12), washes the chuck surface (12), and dries the chuck surface (12) by spinning the chuck (10), in one embodiment. In another embodiment, the chuck surface (12) is dried by pulling a vacuum on the chuck surface (12) or flowing a gas on the chuck surface (12). Additionally, a brush can be used to wash the chuck surface (12).
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Cited Art Landscape
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