Preparation of thin silica films with controlled thickness and tunable refractive index
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United States of America Patent
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Oct 26, 2004
Grant Date -
Dec 11, 2003
app pub date -
Mar 7, 2003
filing date -
Mar 7, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of forming a porous silica film includes the following steps: a) providing a substrate; b) coating, on a surface of the substrate, a layer of charged polyelectrolyte; and c) applying an aged silica-bearing non-colloidal solution to the coated surface of the substrate to adsorb porous silica thereon. The adsorption cycle of steps (b) and (c) is repeated a number of times to control film thickness. The age and concentration of the silica-bearing solution are selected to control the porosity and the index of refraction of the porous silica film.
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