Method and device for monitoring worker's exposure pattern at workplace
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United States of America Patent
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N/A
Issued Date -
Jan 1, 2004
app pub date -
Jun 26, 2002
filing date -
Jun 26, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A device is used to monitor a worker's exposure to a hazardous gas in a workplace. The device includes an infrared locating member, a chemical sensor, a controller, and a power source. The infrared locating member is used to monitor the worker's exposure position. The chemical sensor is uses to monitor the worker's exposure concentration. The controller serves as a central processing unit to receive an exposure position signal from the infrared locating member, and an exposure concentration signal from the chemical sensor. The controller is provided with a built-in or externally-connected timer.
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