Multistep release method for electrochemically fabricated structures

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United States of America Patent

PATENT NO 7303663
APP PUB NO 20040007468A1
SERIAL NO

10434497

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Abstract

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Multilayer structures are electrochemically fabricated from at least one structural material (e.g. nickel), that is configured to define a desired structure and which may be attached to a substrate, and from at least one sacrificial material (e.g. copper) that surrounds the desired structure. After structure formation, the sacrificial material is removed by a multi-stage etching Operation. In some embodiments sacrificial material to be removed may be located within passages or the like on a substrate or within an add-on component. The multi-stage etching Operations may be separated by intermediate post processing activities, they may be separated by cleaning Operations, or barrier material removal Operations, or the like. Barriers may be fixed in position by contact with structural material or with a substrate or they may be solely fixed in position by sacrificial material and are thus free to be removed after all retaining sacrificial material is etched.

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Patent Owner(s)

Patent OwnerAddress
MICROFABRICA INC7911 HASKELL AVENUE VAN NUYS CA 91406

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cohen, Adam L Van Nuys, CA 257 5205
Lockard, Michael S Van Nuys, CA 160 3472
McPherson, Dale S Kissimmee, FL 17 214

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