Method for removing carbon contamination from optic surfaces
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United States of America Patent
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Issued Date -
Jan 22, 2004
app pub date -
Jul 17, 2002
filing date -
Jul 17, 2002
priority date (Note) -
Abandoned
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Abstract
A method using atomic hydrogen for removing carbon contamination from optical surfaces. The method is particularly useful for removing carbon and hydrocarbon contamination in-situ from the surface of the multilayer optics used for extreme ultraviolet lithography (EUVL) without degrading the quality of the optical surface. Atomic hydrogen at pressures in the range of about 10.sup.-3 and 10.sup.-4 Torr without the potentially detrimental heating of the optic is used to provide cleaning rates of about 6-60 .ANG./hr.
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