METHOD FOR MANUFACTURING AUXILIARY GAS-ADDING POLYURETHAE/POLYURETHANE-URE-A POLISHING PAD
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United States of America Patent
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Issued Date -
Feb 5, 2004
app pub date -
Mar 27, 2003
filing date -
Aug 2, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A method for manufacturing a PU (polyurethane) polishing pad is provided. Resins containing active hydrogen functional groups such as polyol resins, polyamine resins, and polythiol resins, and polyisocyanate resins containing --NCO functional groups are mixed to form a foamed PU polishing pad with excellent polishing properties by reaction injection-molding under high pressure, low temperature and auxiliary gas-adding. The PU polishing pad in accompany with an abrasive slurry can be widely used to polish high-level products such as wafers and optical glass.
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