Waferless metrology recipe generator and generating method
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United States of America Patent
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N/A
Issued Date -
Feb 12, 2004
app pub date -
Jun 26, 2003
filing date -
Jun 27, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A metrology recipe generator is offered which is capable of automatically creating a metrology recipe without halting the operation of the production line. The metrology recipe is used to carry out SEM-based dimensional metrology for evaluating patterns transferred onto wafers according to CAD data. The generator has a CAD alignment-specifying portion for specifying alignment in CAD according to CAD data and a CAD metrology position-specifying portion for specifying both the coordinates of positions on the wafers on which metrology measurements are made and a metrology type. The metrology recipe is created according to data from the CAD alignment-specifying portion and from the CAD metrology position-specifying portion.
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Cited Art Landscape
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