Cleaning compositions and methods of use thereof
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United States of America Patent
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Apr 17, 2007
Grant Date -
Apr 8, 2004
app pub date -
Jul 30, 2003
filing date -
Nov 5, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A remover composition and method for removing resists from substrates containing nucleophilic amine and at least one solvent is described. Optionally, a chelating agent can also be included in the remover composition. The remover composition is especially suitable for removing a variety of resists from substrates at different stages in the process of manufacturing integrated circuits.
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