Dual mode hybrid control and method for CMP slurry
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United States of America Patent
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Aug 9, 2005
Grant Date -
Apr 15, 2004
app pub date -
Oct 9, 2002
filing date -
Oct 9, 2002
priority date (Note) -
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Abstract
A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.
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