Method for applying a coating to an optical substrate by thermal vaporization of an organosilicon compound using a non-sintered porous inorganic oxide matrix material
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United States of America Patent
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Issued Date -
Apr 22, 2004
app pub date -
Oct 22, 2002
filing date -
Oct 22, 2002
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Abandoned
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Abstract
A method provides high-vacuum vapor coating methods, with the methods producing novel coating compositions with surprisingly increased performance levels over coatings produced from the same materials under different processing conditions. Compounds of the general formulae II, III and IV, defined herein, can be applied by vapor deposition from a merely compacted, rather than fused or sintered porous matrix source with improved performance, even where the same chemicals are used in the coating, at the same coating temperatures. The generally useful materials include silanes and siloxanes, and siloxazanes of various formulae I, II, III and IV.
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