Pattern inspection apparatus and method
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United States of America Patent
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N/A
Issued Date -
N/A
app pub date -
Oct 21, 2003
filing date -
Aug 26, 1999
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A pattern inspection apparatus inspects fine patterns such as semiconductors (LSI), liquid crystal panels, and masks (reticles) for those. The pattern inspection apparatus includes a storage device for storing said reference pattern, an image generator for scanning the pattern to-be-inspected with a charged particle beam to produce an image of the pattern to-be-inspected, an input device for inputting the image of the pattern to-be-inspected, an inspection device for inspecting the pattern to-be-inspected by comparing an edge of the inputted image of the pattern to-be-inspected and an edge of the stored reference pattern with each other, and an output device for outputting a result of the inspection of the pattern to-be-inspected.
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