Actively-controlled electrostatic chuck heater
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Issued Date -
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app pub date -
Oct 24, 2003
filing date -
May 4, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An apparatus for controlling a temperature of a substrate during semiconductor substrate processing including a semiconductor substrate processing chamber and a substrate support disposed in the chamber. The substrate support includes heater electrode adapted for connection to a power source and disposed within the substrate support, and a meter coupled to the heater electrode for measuring resistivity of the heater electrode as an indicator of the temperature of the heater electrode. A controller is also coupled to the meter and the power source wherein the controller regulates power distribution from the power source to the heater electrode based upon a temperature of the heater electrode, where the temperature is determined from a measured resistivity of the heater electrode.
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