Surface silanization
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United States of America Patent
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app pub date -
Aug 14, 2003
filing date -
Apr 1, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A substrate surface is plasma cleaned and silanized in a chamber. Plasma is generated in the chamber to clean the substrate surface. Gas containing an organosilane compound is introduced into the same chamber to silanized the cleaned surface. Water is deposited on the substrate surface to facilitate silane coupling reaction. A layer of covalently bonded silane molecules having functional groups is thus produced on the substrate surface. The substrate is then cured by a baking process.
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