Method and apparatus for cleaning a semiconductor substrate
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United States of America Patent
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Jan 4, 2005
Grant Date -
Jun 17, 2004
app pub date -
Dec 17, 2002
filing date -
Dec 17, 2002
priority date (Note) -
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Abstract
A stripping solution is supplied onto the surface of a substrate and an alternating magnetic flux is applied to the substrate. The alternating magnetic flux induces a current in a conductive pattern of the substrate which heats the conductive pattern while the stripping solution is in contact with the substrate. The stripping solution, containing particles to be cleaned off the substrate, is then removed from the substrate.
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