Chuck, lithographic apparatus and device manufacturing method
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United States of America Patent
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Aug 15, 2006
Grant Date -
Jun 17, 2004
app pub date -
Aug 19, 2003
filing date -
Aug 23, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithographic projection apparatus is provided with an electrostatic chuck. The electrostatic chuck includes a dielectric element which has a plurality of pins formed on a first surface. The item to be clamped is clamped in position on the chuck by applying a potential difference between an electrode located on the surface of the dielectric member opposite to the clamping surface and an electrode located on the clamping surface of the item to be clamped. The pins are provided with at least an upper conducting layer, which serves to reduce the Johnsen-Rahbek effect, allowing the substrate to be released more quickly.
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