Lithographic apparatus, optical element and device manufacturing method
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United States of America Patent
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Issued Date -
Jul 8, 2004
app pub date -
Oct 24, 2003
filing date -
Oct 31, 2002
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An optical element, such as a multi-layer mirror for an EUV lithography apparatus, is provided, the optical element having a layer comprising one or more Buckminsterfullerenes. Typically the fullerenes are present as a capping layer, which is either provided as the outer capping layer of the optical element or forms a sub-capping layer which is adjacent to an outer capping layer formed of a different material. The fullerene containing layer(s) may alternatively or additionally be present as an interlayer between two layers of a multi-layer mirror.
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