Conductive flakes manufactured by combined sputtering and vapor deposition
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United States of America Patent
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Issued Date -
Aug 5, 2004
app pub date -
Jan 31, 2003
filing date -
Jan 31, 2003
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A release agent is flash evaporated and deposited onto a support substrate under conventional vapor-deposition conditions and a conductive metal oxide, such as ITO, is subsequently sputtered or deposited by reactive electron beam onto the resulting release layer in the same process chamber to form a very thin film of conductive material. The resulting multilayer product is separated from the support substrate, crushed to brake up the metal-oxide film into flakes, and heated or mixed in a solvent to separate the soluble release layer from the metallic flakes. Thus, by judiciously controlling the deposition of the ITO on the release layer, transparent flakes may be obtained with the desired optical and physical characteristics.
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