Patterning solution deposited thin films with self-assembled monolayers
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United States of America Patent
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Feb 17, 2009
Grant Date -
Aug 26, 2004
app pub date -
Jan 21, 2004
filing date -
Apr 21, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention provides a method of forming a patterned thin film on a surface of a substrate having thereon a patterned underlayer of a self-assembled monolayer. The method comprises depositing a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate. The present invention further provides processes for preparing the self-assembled monolayer. The present invention still further provides solution-based deposition processes, such as spin-coating and immersion-coating, to deposit a thin film material on the self-assembled monolayer to produce a patterned thin film on the surface of the substrate.
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