High-purity metal
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United States of America Patent
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app pub date -
Oct 14, 2003
filing date -
Jan 28, 2002
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Abandoned
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Abstract
A high-purity metal (such as magnesium or zinc) containing Cl, F and S in a respective amount of no more than 0.1 ppm, with the total impurity content being no more than 1 ppm.
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