Plasma processing equipment and plasma processing method
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United States of America Patent
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app pub date -
Jan 9, 2004
filing date -
May 10, 2002
priority date (Note) -
Abandoned
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Abstract
A plasma processing apparatus, comprising: at least, a processing chamber for plasma-processing an object to be processed; gas supply means for supplying a gas into the processing chamber; and high-frequency supplying means for forming the gas into a plasma state. The gas supply means has at least one gas introduction pipe, and the tip of the gas introduction pipe is placed in a position in the processing chamber, which is capable of preferred control of the gas dissociation. There are provided a plasma processing apparatus and a plasma processing method which can improve the uniformity in the gas which has been supplied into the processing chamber.
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