Abbe arm calibration system for use in lithographic apparatus
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United States of America Patent
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N/A
Issued Date -
Sep 23, 2004
app pub date -
Apr 2, 2004
filing date -
Jan 14, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.
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