Nail composition
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United States of America Patent
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N/A
Issued Date -
Sep 30, 2004
app pub date -
Mar 28, 2003
filing date -
Mar 28, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The present invention relates to a composition suitable for application as a nail polish, said composition containing (i) at least one film-forming polymer and (ii) a carrier containing water, alcohol, or a mixture thereof, wherein the composition has a percent film retention at 30 minutes of from about 95% to about 50%.
First Claim
Family
International Classification(s)
Cited Art Landscape
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