Conditioner disk for use in chemical mechanical polishing
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United States of America Patent
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May 6, 2008
Grant Date -
Oct 14, 2004
app pub date -
Apr 8, 2003
filing date -
Apr 8, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A conditioner disk for use on a polish pad in chemical mechanical polishing process includes a base structure a plurality of curved blades supported by the base structure. The blades radiate outwardly from a center region of the base structure and curve in a common direction.
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