Beam irradiation apparatus, beam irradiation method, and method for manufacturing thin film transistor
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 13, 2009
Issued Date -
N/A
app pub date -
Apr 20, 2004
filing date -
Apr 21, 2003
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The speed of the laser scanned with the scanning means such as a galvanometer mirror or the polygon mirror is not constant in the center portion and in the end portion of the scanning width. As a result, the object to be irradiated is irradiated with the excessive energy and thereby there is a risk that the amorphous semiconductor film may be peeled.In the case of scanning the spot of the energy beam output continuously with the scanning means, the present invention is to block the CW beam irradiated to the regions in the object to be irradiated where the scanning speed of the spot accelerates, decelerates, and it becomes zero, that is to say, when the spot is in the position where the scanning starts and in the position where the scanning ends.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully