ELECTROPOLISHING ENDPOINT DETECTION METHOD
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United States of America Patent
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Issued Date -
Oct 28, 2004
app pub date -
Feb 24, 2003
filing date -
Feb 25, 2002
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An electropolishing process endpoint detection method is described. The method is applicable to the electropolishing of a metal layer under a fixed current or voltage, wherein a voltage current detector is installed in the electropolishing apparatus. When the electropolishing process is proceeded to the barrier layer, a noticeable change occurs to the electric current or electric voltage because the resistance of the barrier layer is different from that of the metal layer. Based on the change in the saturated current or voltage, the endpoint of the electropolishing process is detected. Further, the voltage or current supply is discontinued by feedback controlling the current or voltage and the electropolishing action is terminated.
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