Facial surveillance system and method

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United States of America Patent

APP PUB NO 20040223629A1
SERIAL NO

10429720

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Abstract

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The present invention discloses a facial surveillance system and method. In this system and method, if a plurality of facial features can be found on a candidate facial area, further detection will be carried out to find any anomaly feature such as a mask, sun glasses or a helmet. Accordingly, potential criminal events may be effectively prevented.

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Patent Owner(s)

Patent OwnerAddress
VISWIS INC2F 159 SEC 1 HOPING E RD TAIPEI 106 R O C

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Jung-Chou Hacienda Heights, CA 2 63

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