Multi-layer mirror for radiation in the xuv wavelenght range and method for manufacture thereof
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United States of America Patent
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Issued Date -
Nov 25, 2004
app pub date -
May 21, 2004
filing date -
May 23, 2001
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Multi-layer mirror for radiation with a wavelength in the wavelength range between 0.1 nm and 30 nm (the so-called XUV range), comprising a stack of thin films substantially comprising scattering particles which scatter the radiation, which thin films are separated by separating layers with a thickness in the order of magnitude of the wavelength of the radiation, which separating layers substantially comprise non-scattering particles which do not scatter the radiation, wherein the non-scattering particles are substantially particles of lithium (Li), and method for manufacturing such a mirror.
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