System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Dec 2, 2004
app pub date -
May 29, 2003
filing date -
May 29, 2003
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A maskless lithography system and method produces gray scale patterns on objects. The system includes an illumination source (e.g., either pulsed or effectively continuous), an object including an array of exposure areas, an array of spatial light modulators (e.g., either digital, binary, or analog), and a controller. The array of spatial light modulators pattern and direct light from the illumination source to the object. Each of the spatial light modulators have active areas that respectively correspond with one of the exposure areas on the object. The controller controls the array of spatial light modulators, such that the pattern of the light has spatially varying intensities.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully