Liquid crystal display device having polycrystalline silicon thin film transistor and method of fabricating the same
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United States of America Patent
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Oct 28, 2008
Grant Date -
Dec 30, 2004
app pub date -
Jun 14, 2004
filing date -
Jun 25, 2003
priority date (Note) -
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Abstract
A method of fabricating an array substrate for a liquid crystal display device includes forming an alignment key on a substrate having a display region and a non-display region surrounding the display region; forming an amorphous silicon layer on the alignment key; crystallizing a predetermined portion of the amorphous silicon layer using the alignment key as a reference; patterning the amorphous silicon layer using the alignment key as a reference to form a polycrystalline silicon layer, the polycrystalline silicon layer being formed from the predetermined portion of the amorphous silicon layer; forming a gate insulating layer on the semiconductor layer; forming a gate electrode on the gate insulating layer using the alignment key as a reference; forming an interlayer insulating layer on the gate electrode; and forming source and drain electrodes on the interlayer insulating layer.
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