Contamination control system and air-conditioning system of a substrate processing apparatus using the same
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United States of America Patent
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-
Feb 5, 2008
Grant Date -
Jan 6, 2005
app pub date -
Jul 1, 2004
filing date -
Jul 3, 2003
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
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