Importance

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Abstract

A process for depositing anti-microbial materials into or onto the surface of a substrate using ionic plasma deposition. The process includes the steps of providing a cathode of target material having anti-microbial potential which is disposed within a partial vacuum, powering the cathode to generate a plasma discharge for ionizing the target material into a plasma of constituent particles. The plasma particles are reacted with ionized gas, and are selected, controlled and directed toward the substrate by electromagnetic fields generated by at least one first anode adjacent to the cathode and at least one second anode positioned adjacent the first anode. Additional anode structures and charged screens provide further control of the plasma constituents. The plasma constituents, comprising the anti-microbial materials, are deposited on the substrate as dispersed ordered structures which form an anti-microbial surface into and onto the substrate.

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First Claim