Interspinous process distraction implant and method of implantation
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United States of America Patent
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Jun 23, 2009
Grant Date -
Jan 13, 2005
app pub date -
Apr 1, 2004
filing date -
May 22, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
An implant for positioning between the spinous processes, such as the spinous processes of cervical vertebrae, include first and second wings foe lateral positioning and a spacer located between the adjacent spinous processes. The implant can be positioned using minimally invasive procedures without modifying the bone or severing ligaments. The implant is shaped in accordance with the anatomy of the spine.
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