Method of depositing coating by plasma; device for implementing the method and coating obtained by said method
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United States of America Patent
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Issued Date -
Jan 27, 2005
app pub date -
Aug 16, 2004
filing date -
Aug 1, 2000
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method for using low pressure plasma to deposit a coating on an object to be treated, whereby the plasma is obtained by partially ionizing, under the action of an electromagnetic field, a reaction fluid injected under low pressure into a treatment zone. The method includes at least two steps: a first step during which the reaction fluid is injected into the treatment zone at a first flow rate and under a given pressure, and a second step during which the same reaction fluid is injected into the treatment zone at a second flow rate lower than the first flow rate.
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