Method for producing a capacitor
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United States of America Patent
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Aug 15, 2006
Issued Date -
N/A
app pub date -
Jul 9, 2004
filing date -
Jan 11, 2002
priority date (Note) -
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Abstract
A method for producing a capacitor comprises providing a raw structure having a substrate and at least one dielectric layer, wherein a first area and a second area of the substrate are separated by an isolating layer. Above the first and second areas, an electrically conductive layer is arranged on the at least one dielectric layer. Further, a mask layer is deposited on the electrically conductive layer, wherein it is structured for generating a first mask above the first area. The method further comprises etching away the electrically conductive layer and at least one of the dielectric layers in the second area by means of the first mask and completing an active device in the second area.
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