Deposition of silica coatings on a substrate
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United States of America Patent
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Issued Date -
Mar 3, 2005
app pub date -
Aug 29, 2003
filing date -
Aug 29, 2003
priority date (Note) -
Abandoned
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Abstract
A process for the production of a silica coating on a glass substrate provides a precursor mixture of SiH.sub.4, NH.sub.3, and O.sub.2, preferably in the presence of C.sub.2H.sub.4 and an inert carrier gas. The precursor mixture is directed along a surface of the glass substrate in an atmospheric pressure, on-line, chemical vapor deposition process. The precursor mixture is reacted at the surface of the glass substrate to form a silica coating, essentially devoid of nitrogen, on the glass substrate.
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